Effect of Cr doping on optical and electrical properties of CuO thin films deposited by spray pyrolysis technique

Abstract

This research aims to study the effect of chromium doping on the optical and electrical properties of copper oxide thin films prepared using the spray pyrolysis technique. Copper oxide thin films are considered promising materials for various applications in optoelectronic and thermoelectric devices. Doping with elements such as chromium can effectively enhance their optical and electrical properties, making them suitable for different technological applications such as gas sensors, solar cells, and display devices. In this work, thin films of copper oxide doped with chromium (CuO:Cr) were fabricated at different doping levels (0 at. %, 3 at. %, 6 at. %, 9 at. %, and 12 at. %) on glass substrates using spray pyrolysis and thermal decomposition techniques. Solutions of copper chloride and chromium chloride were used to prepare the necessary solutions. During the preparation, specific conditions were maintained, such as substrate temperature and evaporation rate, to ensure the formation of homogeneous films. The results showed that increasing the chromium concentration significantly affected the films’s properties. where the bandgap increased and the optical absorption decreased with higher chromium doping levels. Additionally, the study demonstrated that the doped CuO:Cr films exhibited good electrical conductivity, making them suitable for various applications. It is worth noting that factors such as solution concentration, thermal treatment, and the substrate play a significant role in enhancing the films' properties. Overall, the study concluded that doping with chromium is an effective method to improve the performance of copper oxide thin films by controlling the preparation conditions and chromium concentration to achieve the best optical and electrical properties.